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Hiroyuki Miyazoe
Hiroyuki Miyazoe
IBM T.J. Watson Research Center
Verified email at us.ibm.com - Homepage
Title
Cited by
Cited by
Year
Carbon nanotube complementary wrap-gate transistors
AD Franklin, SO Koswatta, DB Farmer, JT Smith, L Gignac, CM Breslin, ...
Nano letters 13 (6), 2490-2495, 2013
2192013
Selective sputtering for pattern transfer
M Hoinkis, H Miyazoe, E Joseph
US Patent 9,493,879, 2016
1882016
Copper residue chamber clean
M Hoinkis, C Yan, H Miyazoe, E Joseph
US Patent 9,114,438, 2015
1842015
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
1792014
IEEE International Electron Devices Meeting (IEDM)
W Kim, T Todorov, M Onen, T Gokmen, D Bishop, P Solomon, KT Lee, ...
San Francisco, CA, USA, 38.3, 2019
1362019
Effect of annealing on the mobility and morphology of thermally activated pentacene thin film transistors
D Guo, S Ikeda, K Saiki, H Miyazoe, K Terashima
Journal of applied physics 99 (9), 2006
1112006
Metal-oxide based, CMOS-compatible ECRAM for deep learning accelerator
S Kim, T Todorov, M Onen, T Gokmen, D Bishop, P Solomon, KT Lee, ...
2019 IEEE International Electron Devices Meeting (IEDM), 35.7. 1-35.7. 4, 2019
732019
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
HY Tsai, H Miyazoe, S Engelmann, B To, E Sikorski, J Bucchignano, ...
Journal of Vacuum Science & Technology B 30 (6), 2012
422012
A study on OTS-PCM pillar cell for 3-D stackable memory
WC Chien, CW Yeh, RL Bruce, HY Cheng, IT Kuo, CH Yang, A Ray, ...
IEEE Transactions on Electron Devices 65 (11), 5172-5179, 2018
402018
Scalable and fully self-aligned n-type carbon nanotube transistors with gate-all-around
AD Franklin, SO Koswatta, D Farmer, GS Tulevski, JT Smith, H Miyazoe, ...
2012 International Electron Devices Meeting, 4.5. 1-4.5. 4, 2012
402012
The influence of process parameters on precursor evaporation for alumina nanopowder synthesis in an inductively coupled rf thermal plasma
JW Shin, H Miyazoe, M Leparoux, S Siegmann, JL Dorier, C Hollenstein
Plasma Sources Science and Technology 15 (3), 441, 2006
382006
Pulsed laser ablation synthesis of diamond molecules in supercritical fluids
S Nakahara, S Stauss, H Miyazoe, T Shizuno, M Suzuki, H Kataoka, ...
Applied Physics Express 3 (9), 096201, 2010
352010
Graphoepitaxy of sexithiophene on thermally oxidized silicon surface with artificial periodic grooves
S Ikeda, K Saiki, K Tsutsui, T Edura, Y Wada, H Miyazoe, K Terashima, ...
Applied physics letters 88 (25), 2006
352006
Resistivity of copper interconnects beyond the 7 nm node
A Pyzyna, R Bruce, M Lofaro, H Tsai, C Witt, L Gignac, M Brink, M Guillorn, ...
2015 Symposium on VLSI Technology (VLSI Technology), T120-T121, 2015
342015
Pathway to the piezoelectronic transduction logic device
PM Solomon, BA Bryce, MA Kuroda, R Keech, S Shetty, TM Shaw, ...
Nano letters 15 (4), 2391-2395, 2015
332015
Tone inversion of self-assembled self-aligned structures
MA Guillorn, SJ Holmes, C Liu, H Miyazoe, H Tsai
US Patent 8,771,929, 2014
332014
Electron beam generated plasmas: Characteristics and etching of silicon nitride
SG Walton, DR Boris, SC Hernández, EH Lock, TB Petrova, GM Petrov, ...
Microelectronic Engineering 168, 89-96, 2017
322017
Systematic studies on reactive ion etch-induced deformations of organic underlayers
M Glodde, S Engelmann, M Guillorn, S Kanakasabapathy, E Mclellan, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 360-367, 2011
322011
Improving the metallic content of focused electron beam-induced deposits by a scanning electron microscope integrated hydrogen-argon microplasma generator
H Miyazoe, I Utke, H Kikuchi, S Kiriu, V Friedli, J Michler, K Terashima
Journal of Vacuum Science & Technology B 28 (4), 744-750, 2010
312010
Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes
H Miyazoe, I Utke, J Michler, K Terashima
Applied Physics Letters 92 (4), 2008
302008
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