| Wafer scale patterning by soft UV-nanoimprint lithography U Plachetka, M Bender, A Fuchs, B Vratzov, T Glinsner, F Lindner, H Kurz Microelectronic Engineering 73, 167-171, 2004 | 189 | 2004 |
| UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing R Ji, M Hornung, MA Verschuuren, R van de Laar, J van Eekelen, ... Microelectronic Engineering 87 (5-8), 963-967, 2010 | 180 | 2010 |
| High resolution lithography with PDMS molds M Bender, U Plachetka, J Ran, A Fuchs, B Vratzov, H Kurz, T Glinsner, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 145 | 2004 |
| Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material N Koo, M Bender, U Plachetka, A Fuchs, T Wahlbrink, J Bolten, H Kurz Microelectronic Engineering 84 (5-8), 904-908, 2007 | 135 | 2007 |
| Status and prospects of UV-nanoimprint technology M Bender, A Fuchs, U Plachetka, H Kurz Microelectronic Engineering 83 (4-9), 827-830, 2006 | 95 | 2006 |
| The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography N Koo, U Plachetka, M Otto, J Bolten, J Jeong, E Lee, H Kurz Nanotechnology 19 (22), 225304, 2008 | 68 | 2008 |
| 3D structures for UV-NIL template fabrication with grayscale e-beam lithography G Piaszenski, U Barth, A Rudzinski, A Rampe, A Fuchs, M Bender, ... Microelectronic Engineering 84 (5-8), 945-948, 2007 | 49 | 2007 |
| Ultraviolet-based nanoimprint at reduced environmental pressure A Fuchs, M Bender, U Plachetka, U Hermanns, H Kurz Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 41 | 2005 |
| Comparison of multilayer stamp concepts in UV–NIL U Plachetka, M Bender, A Fuchs, T Wahlbrink, T Glinsner, H Kurz Microelectronic Engineering 83 (4-9), 944-947, 2006 | 32 | 2006 |
| Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching JW Kim, U Plachetka, C Moormann, H Kurz Microelectronic engineering 110, 403-407, 2013 | 26 | 2013 |
| Lithography potentials of UV-nanoimprint A Fuchs, M Bender, U Plachetka, L Kock, N Koo, T Wahlbrink, H Kurz Current Applied Physics 8 (6), 669-674, 2008 | 26 | 2008 |
| A comparative study based on optical and electrical performance of micro-and nano-textured surfaces for silicon solar cells R Khandelwal, U Plachetka, B Min, C Moormann, H Kurz Microelectronic engineering 111, 220-223, 2013 | 23 | 2013 |
| Fabrication of photonic ring resonator device in silicon waveguide technology using soft UV-nanoimprint lithography U Plachetka, N Koo, T Wahlbrink, J Bolten, M Waldow, T Plotzing, M Forst, ... IEEE Photonics Technology Letters 20 (7), 490-492, 2008 | 22 | 2008 |
| Soft UV-based nanoimprint lithography for large-area imprinting applications T Glinsner, U Plachetka, T Matthias, M Wimplinger, P Lindner Emerging Lithographic Technologies XI 6517, 387-393, 2007 | 19 | 2007 |
| Evaluation of an on-site surface enhanced Raman scattering sensor for benzotriazole F Wieduwilt, C Lenth, G Ctistis, U Plachetka, M Möller, H Wackerbarth Scientific Reports 10 (1), 8260, 2020 | 17 | 2020 |
| Liquid transfer nanoimprint replication on non-flat surfaces for optical applications C Moormann, N Koo, J Kim, U Plachetka, F Schlachter, C Nowak Microelectronic engineering 100, 28-32, 2012 | 17 | 2012 |
| Role of substrate surface morphology on the performance of graphene inks for flexible electronics J Ruhkopf, S Sawallich, M Nagel, M Otto, U Plachetka, T Kremers, ... ACS Applied Electronic Materials 1 (9), 1909-1916, 2019 | 16 | 2019 |
| Nanowire fin field effect transistors via UV-based nanoimprint lithography A Fuchs, M Bender, U Plachetka, L Kock, T Wahlbrink, HDB Gottlob, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 16 | 2006 |
| UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100 nm half-pitch wire grid polarizer F Schlachter, J Barnett, U Plachetka, C Nowak, M Messerschmidt, ... Microelectronic Engineering 155, 118-121, 2016 | 13 | 2016 |
| Fabrication of photonic components by nanoimprint technology within ePIXnet U Plachetka, A Kristensen, S Scheerlinck, J Huskens, N Koo, H Kurz Microelectronic engineering 85 (5-6), 886-889, 2008 | 12 | 2008 |
