Michael J. Maher
Michael J. Maher
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Block copolymer lithography
CM Bates, MJ Maher, DW Janes, CJ Ellison, CG Willson
Macromolecules 47 (1), 2-12, 2014
Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains
CM Bates, T Seshimo, MJ Maher, WJ Durand, JD Cushen, LM Dean, ...
Science 338 (6108), 775-779, 2012
Design of high‐χ block copolymers for lithography
WJ Durand, G Blachut, MJ Maher, S Sirard, S Tein, MC Carlson, Y Asano, ...
Journal of Polymer Science Part A: Polymer Chemistry 53 (2), 344-352, 2015
Interfacial Design for Block Copolymer Thin Films
MJ Maher, CM Bates, G Blachut, S Sirard, JL Self, MC Carlson, LM Dean, ...
Chemistry of Materials 26 (3), 1471-1479, 2014
Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae
AP Lane, XM Yang, MJ Maher, G Blachut, Y Asano, Y Someya, ...
ACS nano 11 (8), 7656-7665, 2017
Consequences of Grafting Density on the Linear Viscoelastic Behavior of Graft Polymers
IN Haugan, MJ Maher, AB Chang, TP Lin, RH Grubbs, MA Hillmyer, ...
ACS Macro Letters 7 (5), 525-530, 2018
Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films
MJ Maher, CT Rettner, CM Bates, G Blachut, MC Carlson, WJ Durand, ...
ACS applied materials & interfaces 7 (5), 3323-3328, 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST
J Cushen, L Wan, G Blachut, MJ Maher, TR Albrecht, CJ Ellison, ...
ACS applied materials & interfaces 7 (24), 13476-13483, 2015
Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films
MJ Maher, JL Self, P Stasiak, G Blachut, CJ Ellison, MW Matsen, ...
ACS nano 10 (11), 10152-10160, 2016
Experimental and modeling study of domain orientation in confined block copolymer thin films
WJ Durand, MC Carlson, MJ Maher, G Blachut, LJ Santos, S Tein, ...
Macromolecules 49 (1), 308-316, 2016
Characterizing the Interface Scaling of High χ Block Copolymers near the Order–Disorder Transition
DF Sunday, MJ Maher, AF Hannon, CD Liman, S Tein, G Blachut, ...
Macromolecules 51 (1), 173-180, 2018
A hybrid chemo-/grapho-epitaxial alignment strategy for defect reduction in sub-10 nm directed self-assembly of silicon-containing block copolymers
G Blachut, SM Sirard, MJ Maher, Y Asano, Y Someya, AP Lane, ...
Chemistry of Materials 28 (24), 8951-8961, 2016
Physical Aging of Polylactide-Based Graft Block Polymers
IN Haugan, B Lee, MJ Maher, A Zografos, HJ Schibur, SD Jones, ...
Macromolecules 52 (22), 8878-8894, 2019
Photopatternable Interfaces for Block Copolymer Lithography
MJ Maher, CM Bates, G Blachut, MC Carlson, JL Self, DW Janes, ...
ACS Macro Letters 3 (8), 824-828, 2014
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers
MJ Maher, K Mori, SM Sirard, AM Dinhobl, CM Bates, E Gurer, G Blachut, ...
ACS Macro Letters 5, 391-395, 2016
Photopatterning of Block Copolymer Thin Films
AP Lane, MJ Maher, CG Willson, CJ Ellison
ACS Macro Letters 5 (4), 460-465, 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
HY Tsai, H Miyazoe, A Vora, T Magbitang, N Arellano, CC Liu, MJ Maher, ...
Advances in Patterning Materials and Processes XXXIII 9779, 977910, 2016
Block copolymer orientation control using a top-coat surface treatment
T Seshimo, CM Bates, LM Dean, JD Cushen, WJ Durand, MJ Maher, ...
Journal of Photopolymer Science and Technology 25 (1), 125-130, 2012
Interactions between plasma and block copolymers used in directed self-assembly patterning
S Sirard, L Azarnouche, E Gurer, W Durand, M Maher, K Mori, G Blachut, ...
SPIE Advanced Lithography, 97820K-97820K-11, 2016
Micro/Nano Lithography Plasma etch of block copolymers for lithography
S Sirard, L Azarnouche, E Gurer, W Durand, M Maher, K Mori, G Blachut, ...
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