Kenneth A. Goldberg

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Patrick NaulleauLawrence Berkeley National LabDirección de correo verificada de lbl.gov
Jeffrey Bokor Professor of electrical engineering and computer sciences, University of California, BerkeleyDirección de correo verificada de eecs.berkeley.edu
Iacopo MochiPaul Scherrer InstitutDirección de correo verificada de psi.ch
Eric GulliksonLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Antoine WojdylaLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Sungmin HuhSamsung electronicsDirección de correo verificada de samsung.com
Wayne R. McKinneyLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Richard CelestreAssociate Beamline Scientist, Advanced Light SourceDirección de correo verificada de lbl.gov
H A PadmoreLawrence Berkekely National LabDirección de correo verificada de lbl.gov
James Alexander LiddleScientific Director, Microsystems and Nanotechnology Division, NISTDirección de correo verificada de nist.gov
mourad idirBNL / NSLS IIDirección de correo verificada de bnl.gov
Yow-Gwo WangIntelDirección de correo verificada de intel.com
Ted LiangIntel CorporationDirección de correo verificada de intel.com
Samuel BucourtImagine OpticDirección de correo verificada de imagine-optic.com
Xavier LevecqImagine OpticDirección de correo verificada de imagine-optic.com
Philippe ZeitounCNRSDirección de correo verificada de ensta.fr
Laura WallerUC BerkeleyDirección de correo verificada de alum.mit.edu
Lahsen AssoufidPhysicist and Optics Group Leader, Argonne National LaboratoryDirección de correo verificada de anl.gov
Rashi GargGlobal FoundriesDirección de correo verificada de globalfoundries.com
Bruce W. SmithProfessor, Microsystems Engineering, Rochester Institute of TechnologyDirección de correo verificada de rit.edu

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Kenneth A. Goldberg

Optical Physicist, Advanced Light Source, Lawrence Berkeley National Laboratory

Dirección de correo verificada de lbl.gov - Página principal

Optics Adaptive X-Ray Optics Wavefront Sensors X-Ray Beamlines Extreme Ultraviolet


Título Ordenar por citas Ordenar por año Ordenar por título	Citado por Citado por	Año
Phase-shifting point diffraction interferometer H Medecki, E Tejnil, KA Goldberg, J Bokor Optics letters 21 (19), 1526-1528, 1996	215	1996
Fourier-transform method of phase-shift determination KA Goldberg, J Bokor Applied optics 40 (17), 2886-2894, 2001	158	2001
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor Applied Optics 38 (35), 7252-7263, 1999	145	1999
Hartmann wave-front measurement at 13.4 nm with λ_EUV/120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ... Optics letters 28 (17), 1534-1536, 2003	125	2003
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ... Emerging Lithographic Technologies VIII 5374, 881-891, 2004	110	2004
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system PP Naulleau, KA Goldberg, J Bokor Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000	94	2000
Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011	89	2011
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa Applied Optics 42 (5), 820-826, 2003	86	2003
System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ... Emerging Lithographic Technologies V 4343, 19-37, 2001	81	2001
EUV engineering test stand DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ... Emerging Lithographic Technologies IV 3997, 48-69, 2000	79	2000
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ... Optics letters 34 (3), 271-273, 2009	75	2009
At-wavelength interferometry for extreme ultraviolet lithography E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997	75	1997
Modal wavefront reconstruction from its gradient I Mochi, KA Goldberg Applied Optics 54 (12), 3780-3785, 2015	69	2015
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ... IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999	66	1999
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006	65	2006
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002	62	2002
At-wavelength alignment and testing of the 0.3 NA MET optic KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004	60	2004
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004	59	2004
EUV microexposures at the ALS using the 0.3-NA MET projection optics P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ... Emerging Lithographic Technologies IX 5751, 56-63, 2005	58	2005
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry PP Naulleau, KA Goldberg, SH Lee, CHC Chang, CJ Bresloff, PJ Batson, ... Emerging Lithographic Technologies II 3331, 114-123, 1998	58	1998

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