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Daniel Lundin
Daniel Lundin
Guest professor, Linköping University
Verified email at liu.se - Homepage
Title
Cited by
Cited by
Year
High power impulse magnetron sputtering discharge
JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
7342012
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
4422010
An introduction to thin film processing using high-power impulse magnetron sputtering
D Lundin, K Sarakinos
Journal of Materials Research 27 (5), 780-792, 2012
3382012
Cross-field ion transport during high power impulse magnetron sputtering
D Lundin, P Larsson, E Wallin, M Lattemann, N Brenning, U Helmersson
Plasma Sources Science and Technology 17 (3), 035021, 2008
1732008
A strategy for increased carbon ionization in magnetron sputtering discharges
A Aijaz, K Sarakinos, D Lundin, N Brenning, U Helmersson
Diamond and related materials 23, 1-4, 2012
1252012
Spokes and charged particle transport in HiPIMS magnetrons
N Brenning, D Lundin, T Minea, C Costin, C Vitelaru
Journal of Physics D: Applied Physics 46 (8), 084005, 2013
1212013
On the electron energy in the high power impulse magnetron sputtering discharge
JT Gudmundsson, P Sigurjonsson, P Larsson, D Lundin, U Helmersson
Journal of Applied Physics 105 (12), 2009
1132009
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
C Huo, MA Raadu, D Lundin, JT Gudmundsson, A Anders, N Brenning
Plasma Sources Science and Technology 21 (4), 045004, 2012
1112012
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
C Huo, MA Raadu, D Lundin, JT Gudmundsson, A Anders, N Brenning
Plasma Sources Science and Technology 21 (4), 045004, 2012
1112012
High power impulse magnetron sputtering: fundamentals, technologies, challenges and applications
D Lundin, T Minea, JT Gudmundsson
Elsevier, 2019
1092019
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
M Aiempanakit, A Aijaz, D Lundin, U Helmersson, T Kubart
Journal of Applied Physics 113 (13), 2013
1092013
Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics
C Vitelaru, D Lundin, GD Stancu, N Brenning, J Bretagne, T Minea
Plasma Sources Science and Technology 21 (2), 025010, 2012
1072012
An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge
JT Gudmundsson, D Lundin, N Brenning, MA Raadu, C Huo, TM Minea
Plasma Sources Science and Technology 25 (6), 065004, 2016
1052016
Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
D Lundin, N Brenning, D Jädernäs, P Larsson, E Wallin, M Lattemann, ...
Plasma Sources Science and Technology 18 (4), 045008, 2009
972009
On sheath energization and Ohmic heating in sputtering magnetrons
C Huo, D Lundin, MA Raadu, A Anders, JT Gudmundsson, N Brenning
Plasma Sources Science and Technology 22 (4), 045005, 2013
952013
On sheath energization and Ohmic heating in sputtering magnetrons
C Huo, D Lundin, MA Raadu, A Anders, JT Gudmundsson, N Brenning
Plasma Sources Science and Technology 22 (4), 045005, 2013
952013
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons
N Brenning, JT Gudmundsson, MA Raadu, TJ Petty, T Minea, D Lundin
Plasma sources science and technology 26 (12), 125003, 2017
872017
Anomalous electron transport in high power impulse magnetron sputtering
D Lundin, U Helmersson, S Kirkpatrick, S Rohde, N Brenning
Plasma Sources Science and Technology 17 (2), 025007, 2008
862008
Energy flux measurements in high power impulse magnetron sputtering
D Lundin, M Stahl, H Kersten, U Helmersson
Journal of Physics D: Applied Physics 42 (18), 185202, 2009
842009
Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
N Brenning, C Huo, D Lundin, MA Raadu, C Vitelaru, GD Stancu, T Minea, ...
Plasma Sources Science and Technology 21 (2), 025005, 2012
822012
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