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Mohammed Belmahi
Mohammed Belmahi
Professor at Université de Lorraine France
Verified email at univ-lorraine.fr
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Year
Freestanding CVD diamond elaborated by pulsed-microwave-plasma for ZnO/diamond SAW devices
T Lamara, M Belmahi, O Elmazria, L Le Brizoual, J Bougdira, M Remy, ...
Diamond and related materials 13 (4-8), 581-584, 2004
802004
Thermal and optical properties of CdS nanoparticles in thermotropic liquid crystal monomers
HL Lee, IA Mohammed, M Belmahi, MB Assouar, H Rinnert, M Alnot
Materials 3 (3), 2069-2086, 2010
492010
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N2/Ar/hexamethyldisilazane microwave plasma
S Bulou, L Le Brizoual, P Miska, L de Poucques, R Hugon, M Belmahi, ...
Thin Solid Films 520 (1), 245-250, 2011
452011
Synthesis and characterizations of bare CdS nanocrystals using chemical precipitation method for photoluminescence application
HL Lee, AM Issam, M Belmahi, MB Assouar, H Rinnert, M Alnot
Journal of Nanomaterials 2009, 1-9, 2009
452009
Growth and characterisation of carbon nanostructures obtained by MPACVD system using CH4/CO2 gas mixture
H Chatei, M Belmahi, MB Assouar, L Le Brizoual, P Bourson, J Bougdira
Diamond and related materials 15 (4-8), 1041-1046, 2006
412006
SAW devices based on ZnO inclined c-axis on diamond
S Bensmaine, L Le Brizoual, O Elmazria, JJ Fundenberger, M Belmahi, ...
Diamond and related materials 17 (7-10), 1420-1423, 2008
372008
MPACVD diamond films for surface acoustic wave filters
MB Assouar, F Bénédic, O Elmazria, M Belmahi, RJ Riobóo, P Alnot
Diamond and related materials 10 (3-7), 681-685, 2001
362001
Wide variations of SiCxNy: H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma
S Bulou, L Le Brizoual, P Miska, L de Poucques, J Bougdira, M Belmahi
Surface and Coatings Technology 208, 46-50, 2012
322012
Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N2/Ar mixture
S Bulou, L Le Brizoual, P Miska, L De Poucques, R Hugon, M Belmahi, ...
Surface and Coatings Technology 205, S214-S217, 2011
292011
Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering
A Bachar, A Bousquet, H Mehdi, G Monier, C Robert-Goumet, L Thomas, ...
Applied Surface Science 444, 293-302, 2018
242018
Cadmium sulfide thin films growth by chemical bath deposition
S Hariech, MS Aida, J Bougdira, M Belmahi, G Medjahdi, D Genève, ...
Journal of Semiconductors 39 (3), 034004, 2018
232018
Diamond thin film growth by pulsed microwave plasma at high power density in a CH4–H2 gas mixture
T Lamara, M Belmahi, J Bougdira, F Bénédic, G Henrion, M Rémy
Surface and Coatings Technology 174, 784-789, 2003
222003
Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture
M Belmahi, S Bulou, A Thouvenin, L De Poucques, R Hugon, ...
Plasma Processes and Polymers 11 (6), 551-558, 2014
212014
Investigations on nitrogen addition in the CH4–H2 gas mixture used for diamond deposition for a better understanding and the optimisation of the synthesis process
F Bénédic, M Belmahi, O Elmazria, MB Assouar, JJ Fundenberger, ...
Surface and Coatings Technology 176 (1), 37-49, 2003
202003
Plasma synthesis of hexagonal-pyramidal graphite hillocks
X Glad, L De Poucques, JA Jaszczak, M Belmahi, J Ghanbaja, J Bougdira
Carbon 76, 330-340, 2014
162014
In situ optical characterization during MPACVD diamond film growth on silicon substrates using a bichromatic infrared pyrometer under oblique incidence
F Bénédic, M Belmahi, T Easwarakhanthan, P Alnot
Journal of Physics D: Applied Physics 34 (7), 1048, 2001
162001
Characterization of a N2/CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition
S Bulou, L Le Brizoual, R Hugon, L De Poucques, M Belmahi, HN Migeon, ...
Plasma processes and polymers 6 (S1), S576-S581, 2009
152009
a-SiCxNy thin films deposited by a microwave plasma assisted CVD process using a CH4/N2/Ar/HMDSN mixture: methane rate effect
S Bulou, L Le Brizoual, P Miska, L De Poucques, R Hugon, M Belmahi
IOP Conference Series: Materials Science and Engineering 12 (1), 012002, 2010
132010
Role of silicon on the growth mechanisms of CNx and SiCN thin films by N2/CH4 microwave plasma assisted chemical vapour deposition
P Kouakou, M Belmahi, V Brien, V Hody, HN Migeon, J Bougdira
Surface and Coatings Technology 203 (3-4), 277-283, 2008
132008
Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and …
P Kouakou, V Brien, B Assouar, V Hody, M Belmahi, HN Migeon, ...
Plasma Processes and Polymers 4 (S1), S210-S214, 2007
132007
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