| PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads M Gebhard, L Mai, L Banko, F Mitschker, C Hoppe, M Jaritz, D Kirchheim, ... ACS applied materials & interfaces 10 (8), 7422-7434, 2018 | 45 | 2018 |
| Water assisted atomic layer deposition of yttrium oxide using tris (N, N′-diisopropyl-2-dimethylamido-guanidinato) yttrium (iii): process development, film characterization … L Mai, N Boysen, E Subaşı, T de Los Arcos, D Rogalla, G Grundmeier, ... RSC advances 8 (9), 4987-4994, 2018 | 42 | 2018 |
| Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based … L Mai, D Zanders, E Subaşı, E Ciftyurek, C Hoppe, D Rogalla, W Gilbert, ... ACS applied materials & interfaces 11 (3), 3169-3180, 2019 | 33 | 2019 |
| Nanostructured Fe2O3 Processing via Water‐Assisted ALD and Low‐Temperature CVD from a Versatile Iron Ketoiminate Precursor D Peeters, A Sadlo, K Lowjaga, O Mendoza Reyes, L Wang, L Mai, ... Advanced Materials Interfaces 4 (18), 1700155, 2017 | 33 | 2017 |
| Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor L Mai, Z Giedraityte, M Schmidt, D Rogalla, S Scholz, AD Wieck, A Devi, ... Journal of Materials Science 52, 6216-6224, 2017 | 29 | 2017 |
| CVD-grown copper tungstate thin films for solar water splitting D Peeters, OM Reyes, L Mai, A Sadlo, S Cwik, D Rogalla, HW Becker, ... Journal of Materials Chemistry A 6 (22), 10206-10216, 2018 | 28 | 2018 |
| From precursor chemistry to gas sensors: Plasma‐enhanced atomic layer deposition process engineering for zinc oxide layers from a nonpyrophoric zinc precursor for gas barrier … L Mai, F Mitschker, C Bock, A Niesen, E Ciftyurek, D Rogalla, J Mickler, ... Small 16 (22), 1907506, 2020 | 22 | 2020 |
| Cobalt metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity Co thin films D Zanders, J Liu, J Obenlüneschloß, C Bock, D Rogalla, L Mai, M Nolan, ... Chemistry of Materials 33 (13), 5045-5057, 2021 | 20 | 2021 |
| Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and … L Mai, M Gebhard, T de Los Arcos, I Giner, F Mitschker, M Winter, ... Chemistry–A European Journal 23 (45), 10768-10772, 2017 | 20 | 2017 |
| Molecular permeation in freestanding bilayer silica D Naberezhnyi, L Mai, N Doudin, I Ennen, A Hütten, EI Altman, A Devi, ... Nano Letters 22 (3), 1287-1293, 2022 | 19 | 2022 |
| Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate M Siebels, L Mai, L Schmolke, K Schütte, J Barthel, J Yue, J Thomas, ... Beilstein journal of nanotechnology 9 (1), 1881-1894, 2018 | 19 | 2018 |
| Up-converting ALD/MLD thin films with Yb3+, Er3+ in amorphous organic framework M Tuomisto, Z Giedraityte, L Mai, A Devi, V Boiko, K Grzeszkiewicz, ... Journal of Luminescence 213, 310-315, 2019 | 17 | 2019 |
| Atomic/molecular layer deposition of Cu–organic thin films DJ Hagen, L Mai, A Devi, J Sainio, M Karppinen Dalton Transactions 47 (44), 15791-15800, 2018 | 17 | 2018 |
| Rational development of guanidinate and amidinate based cerium and ytterbium complexes as atomic layer deposition precursors: synthesis, modeling, and application P Kaur, L Mai, A Muriqi, D Zanders, R Ghiyasi, M Safdar, N Boysen, ... Chemistry–A European Journal 27 (15), 4913-4926, 2021 | 16 | 2021 |
| CVD grown tungsten oxide for low temperature hydrogen sensing: tuning surface characteristics via materials processing for sensing applications M Wilken, E Ciftyürek, S Cwik, L Mai, B Mallick, D Rogalla, K Schierbaum, ... Small 19 (1), 2204636, 2023 | 12 | 2023 |
| Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis J Hirst, S Müller, D Peeters, A Sadlo, L Mai, OM Reyes, D Friedrich, ... Zeitschrift für Physikalische Chemie 234 (4), 699-717, 2020 | 12 | 2020 |
| Potential precursor alternatives to the pyrophoric trimethylaluminium for the atomic layer deposition of aluminium oxide L Mai, N Boysen, D Zanders, T de Los Arcos, F Mitschker, B Mallick, ... Chemistry–A European Journal 25 (31), 7489-7500, 2019 | 9 | 2019 |
| Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiOx thin films on PDMS C Hoppe, F Mitschker, L Mai, MO Liedke, T de los Arcos, P Awakowicz, ... Plasma Processes and Polymers 19 (4), 2100174, 2022 | 7 | 2022 |
| Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors A Philip, L Mai, R Ghiyasi, A Devi, M Karppinen Dalton Transactions 51 (38), 14508-14516, 2022 | 4 | 2022 |
| Influence of different ester side groups in polymers on the vapor phase infiltration with trimethyl aluminum L Mai, D Maniar, F Zysk, J Schöbel, TD Kühne, K Loos, A Devi Dalton Transactions 51 (4), 1384-1394, 2022 | 4 | 2022 |
Peter AwakowiczProfessor für Elektrotechnik und Plasmatechnik, Ruhr-Universität BochumVerified email at aept.rub.de
