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Jon Tomas Gudmundsson
Jon Tomas Gudmundsson
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Cited by
Year
Ionized physical vapor deposition (IPVD): A review of technology and applications
U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
13142006
High power impulse magnetron sputtering discharge
JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
7342012
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
4402010
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
3732006
Oxygen discharges diluted with argon: dissociation processes
JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
3112007
Physics and technology of magnetron sputtering discharges
JT Gudmundsson
Plasma Sources Science and Technology 29 (11), 113001, 2020
3102020
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005
2982005
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
2732002
Electronegativity of low-pressure high-density oxygen discharges
JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
2442001
The low pressure Cl/O discharge and the role of ClO
EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
231*2010
On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study
JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
1952001
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
1802001
Variable sensitivity of plant communities in Iceland to experimental warming
IS Jónsdóttir, B Magnusson, J Gudmundsson, A Elmarsdottir, H Hjartarson
Global Change Biology 11 (4), 553-563, 2005
1732005
Organic carbon in Icelandic Andosols: geographical variation and impact of erosion
H Óskarsson, Ó Arnalds, J Gudmundsson, G Gudbergsson
Catena 56 (1-3), 225-238, 2004
1632004
Improved volume-averaged model for steady and pulsed-power electronegative discharges
S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A 24 (6), 2025-2040, 2006
1512006
Spatial electron density distribution in a high-power pulsed magnetron discharge
J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
1492005
Experimental studies of O2/Ar plasma in a planar inductive discharge
JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
1441999
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
1372010
Plasma dynamics in a highly ionized pulsed magnetron discharge
J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
1352005
Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules
JT Gudmundsson
Journal of Physics D: Applied Physics 37 (15), 2073, 2004
1212004
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Articles 1–20