| Influence of oxygen exposure on the nucleation of platinum atomic layer deposition: consequences for film growth, nanopatterning, and nanoparticle synthesis AJM Mackus, MA Verheijen, N Leick, AA Bol, WMM Kessels Chemistry of Materials 25 (9), 1905-1911, 2013 | 150 | 2013 |
| Catalytic combustion and dehydrogenation reactions during atomic layer deposition of platinum AJM Mackus, N Leick, L Baker, WMM Kessels Chemistry of Materials 24 (10), 1752-1761, 2012 | 143 | 2012 |
| Atomic layer deposition of Ru from CpRu (CO) 2Et using O2 gas and O2 plasma N Leick, ROF Verkuijlen, L Lamagna, E Langereis, S Rushworth, ... Journal of Vacuum Science & Technology A 29 (2), 2011 | 60 | 2011 |
| In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd N Leick, JW Weber, AJM Mackus, MJ Weber, MCM Van de Sanden, ... Journal of Physics D: Applied Physics 49 (11), 115504, 2016 | 45 | 2016 |
| Phenyl/perfluorophenyl stacking interactions enhance structural order in two-dimensional covalent organic frameworks WA Braunecker, KE Hurst, KG Ray, ZR Owczarczyk, MB Martinez, N Leick, ... Crystal Growth & Design 18 (7), 4160-4166, 2018 | 41 | 2018 |
| Atomic layer deposition of platinum nanoparticles on titanium oxide and tungsten oxide using platinum (II) hexafluoroacetylacetonate and formalin as the reactants VR Anderson, N Leick, JW Clancey, KE Hurst, KM Jones, AC Dillon, ... The Journal of Physical Chemistry C 118 (17), 8960-8970, 2014 | 38 | 2014 |
| Dehydrogenation Reactions during Atomic Layer Deposition of Ru Using O2 N Leick, S Agarwal, AJM Mackus, WMM Kessels Chemistry of Materials 24 (19), 3696-3700, 2012 | 37 | 2012 |
| Plasma-assisted atomic layer deposition of SrTiO3: stoichiometry and crystallinity studied by spectroscopic ellipsometry V Longo, N Leick, F Roozeboom, WMM Kessels ECS Journal of Solid State Science and Technology 2 (1), N15, 2012 | 35 | 2012 |
| Kinetic Enhancement of Direct Hydrogenation of MgB2 to Mg(BH4)2 upon Mechanical Milling with THF, MgH2, and/or Mg C Sugai, S Kim, G Severa, JL White, N Leick, MB Martinez, T Gennett, ... ChemPhysChem 20 (10), 1301-1304, 2019 | 30 | 2019 |
| Beyond Strain: Controlling the Surface Chemistry of CsPbI3 Nanocrystal Films for Improved Stability against Ambient Reactive Oxygen Species T Moot, DR Dikova, A Hazarika, TH Schloemer, SN Habisreutinger, ... Chemistry of Materials 32 (18), 7850-7860, 2020 | 29 | 2020 |
| Atomic Layer Deposition of SiCxNy Using Si2Cl6 and CH3NH2 Plasma RA Ovanesyan, N Leick, KM Kelchner, DM Hausmann, S Agarwal Chemistry of Materials 29 (15), 6269-6278, 2017 | 29 | 2017 |
| Patterns of plasma filaments propagating on a dielectric surface S Célestin, K Allegraud, G Canes-Boussard, N Leick, O Guaitella, ... IEEE Transactions on Plasma Science 36 (4), 1326-1327, 2008 | 26 | 2008 |
| Growth of amorphous and epitaxial ZnSiP 2–Si alloys on Si AD Martinez, EM Miller, AG Norman, RR Schnepf, N Leick, C Perkins, ... Journal of Materials Chemistry C 6 (11), 2696-2703, 2018 | 20 | 2018 |
| Thermal Conversion of Unsolvated Mg(B3H8)2 to BH4– in the Presence of MgH2 A Gigante, N Leick, AS Lipton, B Tran, NA Strange, M Bowden, ... ACS Applied Energy Materials 4 (4), 3737-3747, 2021 | 19 | 2021 |
| Bis (cyclopentadienyl) zirconium (IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD SE Potts, CJ Carmalt, CS Blackman, F Abou-Chahine, N Leick, ... Inorganica Chimica Acta 363 (6), 1077-1083, 2010 | 17 | 2010 |
| Al2O3 Atomic Layer Deposition on Nanostructured γ-Mg(BH4)2 for H2 Storage N Leick, NA Strange, A Schneemann, V Stavila, K Gross, N Washton, ... ACS Applied Energy Materials 4 (2), 1150-1162, 2021 | 16 | 2021 |
| Silicon nitride encapsulated silicon nanocrystals for lithium ion batteries SL Weeks, N Leick, S Agarwal Plasma Processes and Polymers 13 (1), 116-123, 2016 | 14 | 2016 |
| Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18O2 Isotope Labeling N Leick, S Agarwal, AJM Mackus, SE Potts, WMM Kessels The Journal of Physical Chemistry C 117 (41), 21320-21330, 2013 | 14 | 2013 |
| Surface reactions of aminosilane precursors during N2 plasma‐assisted atomic layer deposition of SiNx N Leick, JMM Huijs, RA Ovanesyan, DM Hausmann, S Agarwal Plasma Processes and Polymers 16 (9), 1900032, 2019 | 13 | 2019 |
| Chemical Passivation of Crystalline Si by Al2O3 Deposited Using Atomic Layer Deposition: Implications for Solar Cells AR Meyer, RP Chaukulkar, N Leick, W Nemeth, DL Young, P Stradins, ... ACS Applied Nano Materials 4 (7), 6629-6636, 2021 | 12 | 2021 |
