C. Grant Willson
C. Grant Willson
Professor University of Texas IBM
Verified email at
Cited by
Cited by
New approaches to nanofabrication: molding, printing, and other techniques
BD Gates, Q Xu, M Stewart, D Ryan, CG Willson, GM Whitesides
Chemical reviews 105 (4), 1171-1196, 2005
An introduction to lithography
LF Thompson
Step and flash imprint lithography: a new approach to high-resolution patterning
M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ...
Emerging Lithographic Technologies III 3676, 379-389, 1999
Positive-and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
H Ito, CG Willson, JMJ Frechet
US Patent 4,491,628, 1985
Chemical amplification in the design of dry developing resist materials
H Ito, CG Willson
Polymer Engineering & Science 23 (18), 1012-1018, 1983
Block copolymer lithography
CM Bates, MJ Maher, DW Janes, CJ Ellison, CG Willson
Macromolecules 47 (1), 2-12, 2014
Step and flash imprint lithography
CG Willson, ME Colburn
US Patent 6,334,960, 2002
Step and flash imprint lithography: Template surface treatment and defect analysis
T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire
BJ DeKosky, GC Ippolito, RP Deschner, JJ Lavinder, Y Wine, ...
Nature biotechnology 31 (2), 166-169, 2013
Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains
CM Bates, T Seshimo, MJ Maher, WJ Durand, JD Cushen, LM Dean, ...
Science 338 (6108), 775-779, 2012
Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field
M Eich, B Reck, DY Yoon, CG Willson, GC Bjorklund
Journal of applied Physics 66 (7), 3241-3247, 1989
Template for room temperature, low pressure micro-and nano-imprint lithography
T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt
US Patent 6,696,220, 2004
Poly (p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
JMJ Frechet, E Eichler, H Ito, CG Willson
Polymer 24 (8), 995-1000, 1983
Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films
RH Page, MC Jurich, B Reck, A Sen, RJ Twieg, JD Swalen, GC Bjorklund, ...
JOSA B 7 (7), 1239-1250, 1990
Chemical amplification in high-resolution imaging systems
SA MacDonald, CG Willson, JMJ Frechet
Accounts of Chemical Research 27 (6), 151-158, 1994
Method for imprint lithography using an electric field
SV Sreenivasan, RT Bonnecaze, CG Willson
US Patent 6,908,861, 2005
Highly efficient and stable nonlinear optical polymers via chemical cross‐linking under electric field
D Jungbauer, B Reck, R Twieg, DY Yoon, CG Willson, JD Swalen
Applied Physics Letters 56 (26), 2610-2612, 1990
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications
JD Cushen, I Otsuka, CM Bates, S Halila, S Fort, C Rochas, JA Easley, ...
ACS nano 6 (4), 3424-3433, 2012
Airborne chemical contamination of a chemically amplified resist
SA MacDonald, NJ Clecak, HR Wendt, CG Willson, CD Snyder, CJ Knors, ...
Advances in Resist Technology and Processing VIII 1466, 2-12, 1991
Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
CG Willson, H Ito, JMJ Fréchet, TG Tessier, FM Houlihan
Journal of the Electrochemical Society 133 (1), 181, 1986
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