Mingqi Li
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Block copolymer patterns and templates
M Li, CK Ober
Materials Today 9 (9), 30-39, 2006
Patternable block copolymers
M Li, CA Coenjarts, CK Ober
Block Copolymers II, 183-226, 2005
Spatially controlled fabrication of nanoporous block copolymers
M Li, K Douki, K Goto, X Li, C Coenjarts, DM Smilgies, CK Ober
Chemistry of materials 16 (20), 3800-3808, 2004
Additive‐driven phase‐selective chemistry in block copolymer thin films: the convergence of top–down and bottom–up approaches
P Du, M Li, K Douki, X Li, CBW Garcia, A Jain, DM Smilgies, LJ Fetters, ...
Advanced Materials 16 (12), 953-957, 2004
An efficient route to mesoporous silica films with perpendicular nanochannels
S Nagarajan, M Li, RA Pai, JK Bosworth, P Busch, DM Smilgies, CK Ober, ...
Advanced Materials 20 (2), 246-251, 2008
Orientation control in thin films of a high-χ block copolymer with a surface active embedded neutral layer
J Zhang, MB Clark, C Wu, M Li, P Trefonas III, PD Hustad
Nano letters 16 (1), 728-735, 2016
Rod–coil block copolymers: An iterative synthetic approach via living free‐radical procedures
P Gopalan, X Li, M Li, CK Ober, CP Gonzales, CJ Hawker
Journal of Polymer Science Part A: Polymer Chemistry 41 (22), 3640-3656, 2003
Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
F Weilnboeck, RL Bruce, S Engelmann, GS Oehrlein, D Nest, TY Chung, ...
Journal of Vacuum Science & Technology B 28 (5), 993-1004, 2010
Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening
TY Chung, D Nest, DB Graves, F Weilnboeck, RL Bruce, GS Oehrlein, ...
Journal of physics D: Applied physics 43 (27), 272001, 2010
Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
F Weilnboeck, N Kumar, GS Oehrlein, TY Chung, D Graves, M Li, ...
Journal of Vacuum Science & Technology B 30 (3), 2012
Ion and vacuum ultraviolet photon beam effects in 193 nm photoresist surface roughening: the role of the adamantyl pendant group
TY Chung, DB Graves, F Weilnboeck, RL Bruce, GS Oehrlein, M Li, ...
Plasma Processes and Polymers 8 (11), 1068-1079, 2011
Neutral layer polymers, methods of manufacture thereof and articles comprising the same
P Trefonas III, PD Hustad, D Wang, R Sharma, M Li, JJ Zhang
US Patent 9,382,444, 2016
Mussel-inspired strategy for stabilizing ultrathin polymer films and its application to spin-on doping of semiconductors
R Katsumata, R Limary, Y Zhang, BC Popere, AT Heitsch, M Li, ...
Chemistry of Materials 30 (15), 5285-5292, 2018
Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
P Trefonas III, D Wang, R Sharma, PD Hustad, M Li
US Patent 9,802,400, 2017
Electrical performance of a molecular organic semiconductor under thermal stress
M Seifrid, MJ Ford, M Li, KM Koh, P Trefonas, GC Bazan
Advanced Materials 29 (12), 1605511, 2017
Sulfonium salts of alicyclic group functionalized semifluorinated alkyl ether sulfonates as photoacid generators
Y Yi, R Ayothi, Y Wang, M Li, G Barclay, R Sierra-Alvarez, CK Ober
Chemistry of Materials 21 (17), 4037-4046, 2009
Polymers and photoresist compositions
A Emad, C Liu, CB Xu, M Li
US Patent 10,670,965, 2020
Roughness power spectral density as a function of resist parameters and its impact through process
C Cutler, JW Thackeray, J DeSisto, J Nelson, CB Lee, M Li, E Aqad, ...
Optical Microlithography XXXI 10587, 36-46, 2018
Wet-strippable silicon-containing antireflectant
O Ongayi, C Cutler, M Li, S Yamada, J Cameron
US Patent 10,031,420, 2018
Photoacid generators and photoresists comprising same
M Li, CB Xu, A Emad, C Liu
US Patent 8,338,077, 2012
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