| Block copolymer patterns and templates M Li, CK Ober Materials Today 9 (9), 30-39, 2006 | 317 | 2006 |
| Patternable block copolymers M Li, CA Coenjarts, CK Ober Block Copolymers II, 183-226, 2005 | 169 | 2005 |
| Spatially controlled fabrication of nanoporous block copolymers M Li, K Douki, K Goto, X Li, C Coenjarts, DM Smilgies, CK Ober Chemistry of materials 16 (20), 3800-3808, 2004 | 125 | 2004 |
| Additive‐driven phase‐selective chemistry in block copolymer thin films: the convergence of top–down and bottom–up approaches P Du, M Li, K Douki, X Li, CBW Garcia, A Jain, DM Smilgies, LJ Fetters, ... Advanced Materials 16 (12), 953-957, 2004 | 119 | 2004 |
| An efficient route to mesoporous silica films with perpendicular nanochannels S Nagarajan, M Li, RA Pai, JK Bosworth, P Busch, DM Smilgies, CK Ober, ... Advanced Materials 20 (2), 246-251, 2008 | 79 | 2008 |
| Orientation control in thin films of a high-χ block copolymer with a surface active embedded neutral layer J Zhang, MB Clark, C Wu, M Li, P Trefonas III, PD Hustad Nano letters 16 (1), 728-735, 2016 | 76 | 2016 |
| Rod–coil block copolymers: An iterative synthetic approach via living free‐radical procedures P Gopalan, X Li, M Li, CK Ober, CP Gonzales, CJ Hawker Journal of Polymer Science Part A: Polymer Chemistry 41 (22), 3640-3656, 2003 | 62 | 2003 |
| Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry F Weilnboeck, RL Bruce, S Engelmann, GS Oehrlein, D Nest, TY Chung, ... Journal of Vacuum Science & Technology B 28 (5), 993-1004, 2010 | 60 | 2010 |
| Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening TY Chung, D Nest, DB Graves, F Weilnboeck, RL Bruce, GS Oehrlein, ... Journal of physics D: Applied physics 43 (27), 272001, 2010 | 31 | 2010 |
| Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions F Weilnboeck, N Kumar, GS Oehrlein, TY Chung, D Graves, M Li, ... Journal of Vacuum Science & Technology B 30 (3), 2012 | 29 | 2012 |
| Ion and vacuum ultraviolet photon beam effects in 193 nm photoresist surface roughening: the role of the adamantyl pendant group TY Chung, DB Graves, F Weilnboeck, RL Bruce, GS Oehrlein, M Li, ... Plasma Processes and Polymers 8 (11), 1068-1079, 2011 | 26 | 2011 |
| Neutral layer polymers, methods of manufacture thereof and articles comprising the same P Trefonas III, PD Hustad, D Wang, R Sharma, M Li, JJ Zhang US Patent 9,382,444, 2016 | 25 | 2016 |
| Mussel-inspired strategy for stabilizing ultrathin polymer films and its application to spin-on doping of semiconductors R Katsumata, R Limary, Y Zhang, BC Popere, AT Heitsch, M Li, ... Chemistry of Materials 30 (15), 5285-5292, 2018 | 18 | 2018 |
| Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers P Trefonas III, D Wang, R Sharma, PD Hustad, M Li US Patent 9,802,400, 2017 | 17 | 2017 |
| Electrical performance of a molecular organic semiconductor under thermal stress M Seifrid, MJ Ford, M Li, KM Koh, P Trefonas, GC Bazan Advanced Materials 29 (12), 1605511, 2017 | 17 | 2017 |
| Sulfonium salts of alicyclic group functionalized semifluorinated alkyl ether sulfonates as photoacid generators Y Yi, R Ayothi, Y Wang, M Li, G Barclay, R Sierra-Alvarez, CK Ober Chemistry of Materials 21 (17), 4037-4046, 2009 | 16 | 2009 |
| Polymers and photoresist compositions A Emad, C Liu, CB Xu, M Li US Patent 10,670,965, 2020 | 15 | 2020 |
| Roughness power spectral density as a function of resist parameters and its impact through process C Cutler, JW Thackeray, J DeSisto, J Nelson, CB Lee, M Li, E Aqad, ... Optical Microlithography XXXI 10587, 36-46, 2018 | 14 | 2018 |
| Wet-strippable silicon-containing antireflectant O Ongayi, C Cutler, M Li, S Yamada, J Cameron US Patent 10,031,420, 2018 | 13 | 2018 |
| Photoacid generators and photoresists comprising same M Li, CB Xu, A Emad, C Liu US Patent 8,338,077, 2012 | 13 | 2012 |
